Computer Engineering and Applications ›› 2009, Vol. 45 ›› Issue (23): 214-216.DOI: 10.3778/j.issn.1002-8331.2009.23.061

• 工程与应用 • Previous Articles     Next Articles

3D display for integrate circuit etching result and key technology research

WU Yong-liang,WAN Wang-gen,CUI Bin   

  1. School of Communication and Information Engineering,Shanghai University,Shanghai 200072,China
  • Received:2008-04-25 Revised:2008-07-28 Online:2009-08-11 Published:2009-08-11
  • Contact: WU Yong-liang

集成电路刻蚀效果三维显示及其关键技术研究

吴永亮,万旺根,崔 滨   

  1. 上海大学 通信与信息工程学院,上海 200072
  • 通讯作者: 吴永亮

Abstract: Integrate circuit simulation is an important assistant method,etching is a fatal process in the integrate circuit manufacture.The paper utilizes triangles to model the etching process,and deduces the formulas linking different planes(both plane and curve planes).At last,the etching simulation result is depicted,which proves that the etching result is clear,the imaging speed is fast,and the resource occupancy is small,making the method practical for etching depicting.

摘要: 集成电路仿真是集成电路制造的重要辅助方法,刻蚀过程是集成电路制造的一个重要的过程。使用三角形面片对刻蚀过程进行建模,并推导出连接不同面的平面和曲面的计算公式。最后给出了刻蚀显示仿真结果。结果显示,刻蚀结果清晰,绘制速度快,占用资源少,可以满足实际的刻蚀显示要求。

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